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2024-12-13 12:36:43
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What is the significance of index funds being included in the list of individual pension funds? E Fund: To build an ecology of "long money and long investment", E Fund said that personal pensions will be rolled out nationwide. First, personal pensions will benefit more residents, which will help raise residents' awareness of pension reserves and promote pension planning and investment concepts to be more deeply rooted in the hearts of the people. Second, it is conducive to further improving the multi-level and multi-pillar pension system and promoting the sustainable development of China's pension system. Third, it is expected to bring more medium and long-term funds to the capital market and help the high-quality development of the financial market.Intel: Breakthrough progress has been made in chip interconnection, and the inter-line capacitance has been reduced by 25%. Recently, Intel OEM announced a major breakthrough in on-chip interconnection technology. The latest subtractive Ruthenium interconnection technology of the company can reduce the inter-line capacitance by up to 25%, effectively improving the on-chip interconnection. According to reports, the subtractive ruthenium interconnection technology has achieved great progress in interconnection miniaturization by using ruthenium, a new, key and alternative metallization material, and using thin film resistivity and airgap. This process does not need an expensive photolithographic air gap exclusion zone around the via, and it can also avoid using a self-aligned via that is selectively etched. When the spacing is less than or equal to 25 nm, the air gap realized by reducing ruthenium interconnection technology can reduce the capacitance between lines by up to 25%, which can be used as a metallization scheme to replace copper damascene process in closely spaced layers. It is reported that this solution is expected to be applied in the future process nodes of Intel OEM. (Sina Technology)The FBI director said that his resignation was the best way to avoid friction. Christopher Babers, the FBI director who decided to resign, explained his decision, saying that it was the best way to avoid further friction against the background of criticism from President-elect Trump who was seeking to appoint his cronies as the head of the intelligence department. The FBI quoted Lei as saying: "My purpose is to continue to focus on our mission-the irreplaceable work we do on behalf of Americans every day. I think this is the best way to avoid getting the FBI involved in more friction. " He added that the decision to resign was not easy for him.


Speaker of South Korea's National Assembly: Yin Xiyue will never tolerate declaring martial law in order to warn the National Assembly. On the 12th, South Korea's National Assembly Speaker Yu Yuanzhi said that Yin Xiyue "declared emergency martial law in order to warn the National Assembly, which is absolutely intolerable in the constitutional order, because it means that the democratic constitutional order can be destroyed for political purposes, and the basic rights of the people can also be used as a means for political purposes". Yu Yuanzhi also said that today's presidential talk cannot lead to other misjudgments or social chaos, and Congress will deal with all possible situations.Zuckerberg is reported to have donated $1 million to Trump's inauguration fund.Cross-border payment concept stocks surged before noon, while Gao Weida and Zhaori Technology rose by 20cm, while huijin technology and Xiongdi Technology rose by more than 10%.


Intel: Breakthrough progress has been made in chip interconnection, and the inter-line capacitance has been reduced by 25%. Recently, Intel OEM announced a major breakthrough in on-chip interconnection technology. The latest subtractive Ruthenium interconnection technology of the company can reduce the inter-line capacitance by up to 25%, effectively improving the on-chip interconnection. According to reports, the subtractive ruthenium interconnection technology has achieved great progress in interconnection miniaturization by using ruthenium, a new, key and alternative metallization material, and using thin film resistivity and airgap. This process does not need an expensive photolithographic air gap exclusion zone around the via, and it can also avoid using a self-aligned via that is selectively etched. When the spacing is less than or equal to 25 nm, the air gap realized by reducing ruthenium interconnection technology can reduce the capacitance between lines by up to 25%, which can be used as a metallization scheme to replace copper damascene process in closely spaced layers. It is reported that this solution is expected to be applied in the future process nodes of Intel OEM. (Sina Technology)Foreign media survey: the Korean economy is expected to grow by 1.7% in the fourth quarter of 2024, compared with the previous estimate of 1.8%; In the first quarter of 2025, GDP is expected to increase by 1% year-on-year, compared with the previous estimate of 1.1%.Thai Prime Minister: Will build houses for low-income people; The government will provide soft loans for community enterprises.

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